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Journal Article

Age hardening in (Ti1 − xAlx)B2 + Δ thin films

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Alling,  Björn
Adaptive Structural Materials (Simulation), Computational Materials Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Department of Physics, Chemistry and Biology (IFM), Thin Film Physics Division, Linköping University, Linköping, Sweden;

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Citation

Mockute, A., Palisaitis, J., Alling, B., Berastegui, P., Broitman, E., Näslund, L. Å., et al. (2017). Age hardening in (Ti1 − xAlx)B2 + Δ thin films. Scripta Materialia, 127, 122-126. doi:10.1016/j.scriptamat.2016.09.021.


Cite as: https://hdl.handle.net/21.11116/0000-0001-714A-D
Abstract
Thin films of (Ti0.71Al0.29)B2 + 1.08 have been deposited by magnetron sputtering. Post-deposition annealing at 1000 °C for 1 h results in increased hardness and elastic modulus, from 32 to 37 GPa and from 436 to 461 GPa, respectively. In both as-deposited and annealed states the films adhere well to the substrate, indicating no considerable internal stress. The initial high hardness is attributed to a columnar microstructure consisting of crystalline (Ti,Al)B2 columns separated by an amorphous B matrix. The observed age hardening corresponds to phase separation within the (Ti,Al)B2 columns including the formation of Ti-deficient crystallites within the grain interior upon annealing. © 2016 Acta Materialia Inc.