Work function dependence of vibrational relaxation probabilities: NO(v=2) 
scattering from ultrathin metallic films of Ag/Au(111)

Steinsiek, C.; Shirhatti, P. R.; Geweke, J.; Bartels, C.; Wodtke, A. M.

doi:10.1021/acs.jpcc.8b01950

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Work function dependence of vibrational relaxation probabilities: NO(v=2) scattering from ultrathin metallic films of Ag/Au(111)

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Steinsiek, C.
Department of Dynamics at Surfaces, MPI for Biophysical Chemistry, Max Planck Society;

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Shirhatti, P. R.
Department of Dynamics at Surfaces, MPI for Biophysical Chemistry, Max Planck Society;

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Geweke, J.
Department of Dynamics at Surfaces, MPI for Biophysical Chemistry, Max Planck Society;

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Bartels, C.
Department of Dynamics at Surfaces, MPI for Biophysical Chemistry, Max Planck Society;

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Wodtke, A. M.
Department of Dynamics at Surfaces, MPI for Biophysical Chemistry, Max Planck Society;

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Citation

Steinsiek, C., Shirhatti, P. R., Geweke, J., Bartels, C., & Wodtke, A. M. (2018). Work function dependence of vibrational relaxation probabilities: NO(v=2) scattering from ultrathin metallic films of Ag/Au(111). The Journal of Physical Chemistry C, 122(18), 10027-10033. doi:10.1021/acs.jpcc.8b01950.

Cite as: https://hdl.handle.net/21.11116/0000-0001-6A25-F

Abstract

We present measurements on the vibrational relaxation of NO(v = 2) scattered from atomically defined thin films of Ag on Au(111). The vibrational relaxation probability is strongly dependent on film thickness, increasing with each of the first three Ag monolayers. We interpret this as the influence of work function which changes with layer thickness. This supports the postulated mechanism of NO vibrational relaxation involving a transient NO- anion.