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Interfacial reactions of crystalline Ni and amorphous SiC thin films

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Keita,  A.
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Wang,  Z.
School of Materials Science and Engineering, Tianjin University, Tianjin 300350, China;
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer,  E. J.
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institut für Materialwissenschaft, Universität Stuttgart, Heisenbergstraße 3, 70569 Stuttgart, Germany;

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Citation

Keita, A., Wang, Z., Sigle, W., & Mittemeijer, E. J. (2018). Interfacial reactions of crystalline Ni and amorphous SiC thin films. Journal of Materials Science, 53(9), 6681-6697. doi:10.1007/s10853-018-1986-0.


Cite as: https://hdl.handle.net/21.11116/0000-0001-0C6A-C
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