Nanoscale stability of two- and three-dimensional defects in Cu/Ag–Mo thin films

Csiszár, Gábor; Makvandi, Ardavan; Mittemeijer, Eric Jan

doi:10.1107/S1600576716019129

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Nanoscale stability of two- and three-dimensional defects in Cu/Ag–Mo thin films

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Csiszár, Gábor
Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, Eric Jan
Institut für Materialwissenschaften, Universität Stuttgart, Stuttgart;
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Csiszár, G., Makvandi, A., & Mittemeijer, E. J. (2017). Nanoscale stability of two- and three-dimensional defects in Cu/Ag–Mo thin films. Journal of Applied Crystallography, 50(1), 152-171. doi:10.1107/S1600576716019129.

Cite as: https://hdl.handle.net/11858/00-001M-0000-002E-093A-0

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