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Growth of axial SiGe heterostructures in nanowires using pulsed laser deposition

MPG-Autoren
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Christiansen,  Silke
Christiansen Research Group, Research Groups, Max Planck Institute for the Science of Light, Max Planck Society;
Micro- & Nanostructuring, Technology Development and Service Units, Max Planck Institute for the Science of Light, Max Planck Society;

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Zitation

Eisenhawer, B., Sivakov, V., Berger, A., & Christiansen, S. (2011). Growth of axial SiGe heterostructures in nanowires using pulsed laser deposition. NANOTECHNOLOGY, 22(30): 305604. doi:10.1088/0957-4484/22/30/305604.


Zitierlink: https://hdl.handle.net/11858/00-001M-0000-002D-69B5-5
Zusammenfassung
Axial heterojunctions between pure silicon and pure germanium in nanowires have been realized combining pulsed laser deposition, chemical vapor deposition and electron beam evaporation in a vapor-liquid-solid nanowire growth experiment using gold nanoparticles as catalyst for the 1D wire growth. Energy dispersive x-ray mappings and line scans show a compositional transition from pure silicon to pure germanium and vice versa with exponential and thus comparably sharp transition slopes. Based on these results not only Si-Ge heterojunctions seem to be possible using the vapor-liquid-solid growth process but also heterojunctions in optoelectronic III-V compounds such as InGaAs/GaAs or group III nitride compounds such as InGaN/GaN as well as axial p-n junctions in Si nanowires.