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Resonant metamaterials for contrast enhancement in optical lithography

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Shyroki,  Dzmitry
Nonlinear Optics and Nanophotonics, Leuchs Division, Max Planck Institute for the Science of Light, Max Planck Society;

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Banzer,  Peter
International Max Planck Research School, Max Planck Institute for the Science of Light, Max Planck Society;
Interference Microscopy and Nanooptics, Leuchs Division, Max Planck Institute for the Science of Light, Max Planck Society;

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Peschel,  Ulf
Nonlinear Optics and Nanophotonics, Leuchs Division, Max Planck Institute for the Science of Light, Max Planck Society;

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Citation

Dobmann, S., Shyroki, D., Banzer, P., Erdmann, A., & Peschel, U. (2012). Resonant metamaterials for contrast enhancement in optical lithography. OPTICS EXPRESS, 20(18), 19928-19935. doi:10.1364/OE.20.019928.


Cite as: https://hdl.handle.net/11858/00-001M-0000-002D-6891-C
Abstract
The transmission through ultra-thin metal films is noticeable and thus limits their potential for the formation of lithographic masks. By sub-wavelength patterning of a metal film with a post structure, a resonant metamaterial is formed, which can effectively suppress the transmission. Measurements as well as calculations identify the width of the metal islands as a critical geometrical feature. Hence, the extraordinarily low transmission effect can be explained by the resonant response of single scatterers known as Localized Surface Plasmon Resonances (LSPR). A potential application of this suppressed transmission effect to thin metal masks in optical lithography is experimentally investigated. (C) 2012 Optical Society of America