Evaluation of an Advanced Silicon Doped CFC for Plasma Facing Material

Wu, C.H.; Varandas, C.; Alessandrini, C.; Serra, F.; Bonal, P.; Grote, H.; Balden, M.; Vieider, G.; et al.,

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Evaluation of an Advanced Silicon Doped CFC for Plasma Facing Material

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Grote, H.
Experimental Plasma Physics 2 (E2), Max Planck Institute for Plasma Physics, Max Planck Society;
W7-X: Construction, Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

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Balden, M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Wu, C., Varandas, C., Alessandrini, C., Serra, F., Bonal, P., Grote, H., et al. (1997). Evaluation of an Advanced Silicon Doped CFC for Plasma Facing Material. Fusion Technology, Vol. 1, 327-330.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-D099-2

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