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Conference Paper

Scalable Microwave ECR Plasma Source for Industrial PVD-Applications

MPS-Authors
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Jung,  M.
Experimental Plasma Physics 1 (E1), Max Planck Institute for Plasma Physics, Max Planck Society;

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Leuterer,  F.
Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society;

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Muenich,  M.
Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society;

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Wilhelm,  R.
Technology (TE), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Geisler, M., Harry, J. E., Jung, M., Koetter-Faulhaber, R., Leuterer, F., Muenich, M., et al. (1993). Scalable Microwave ECR Plasma Source for Industrial PVD-Applications. In J. E. Harry (Ed.), Proceedings of the 11th International Symposium on Plasma Chemistry (ISPC 11) (pp. 1143-1147).


Cite as: https://hdl.handle.net/11858/00-001M-0000-0028-CD7F-F
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