Influence of Surface Roughness and Chemisorption on Magnetic Hysteresis Curves 
of a Ni(110) Surface Observed by Spin-Resolved Inverse Photoemission

Donath, M.; Schoenhense, G.; Ertl, K.; Dose, V.

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Influence of Surface Roughness and Chemisorption on Magnetic Hysteresis Curves of a Ni(110) Surface Observed by Spin-Resolved Inverse Photoemission

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Donath, M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Ertl, K.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Dose, V.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Max Planck Institute for Plasma Physics, Max Planck Society;

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Donath, M., Schoenhense, G., Ertl, K., & Dose, V. (1990). Influence of Surface Roughness and Chemisorption on Magnetic Hysteresis Curves of a Ni(110) Surface Observed by Spin-Resolved Inverse Photoemission. Applied Physics A, A50, 1, 49-55.

引用: https://hdl.handle.net/11858/00-001M-0000-0028-C387-2

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