Chemical sputtering yields of carbon based materials at high ion flux densities

Grote, H.; Bohmeyer, W.; Kornejew, P.; Reiner, H. D.; Fussmann, G.; Schlöogl, R.; Weinberg, G.; Wu, C. H.

doi:10.1016/S0022-3115(98)00854-X

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Chemical sputtering yields of carbon based materials at high ion flux densities

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Grote, H.
W7-X: Construction, Max Planck Institute for Plasma Physics, Max Planck Society;

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Bohmeyer, W.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

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Kornejew, P.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

Reiner, H. D.
Max Planck Society;

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Fussmann, G.
Plasma Diagnostics Group (HUB), Max Planck Institute for Plasma Physics, Max Planck Society;

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Grote, H., Bohmeyer, W., Kornejew, P., Reiner, H. D., Fussmann, G., Schlöogl, R., et al. (1999). Chemical sputtering yields of carbon based materials at high ion flux densities. Journal of Nuclear Materials, 266-269, 1059-1064. doi:10.1016/S0022-3115(98)00854-X.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-859A-E

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