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Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon

MPS-Authors
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Jacob,  W.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109597

von Keudell,  A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110460

Schwarz-Selinger,  T.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W., von Keudell, A., & Schwarz-Selinger, T. (2000). Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon. Brazilian Journal of Physics, 30, 508-516. Retrieved from http://www.sbfisica.org.br/bjp/files/v30_508.pdf.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0027-5E6E-7
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