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Transfer of 2D Silica Films

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Büchner,  Christin
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Heyde,  Markus
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Citation

Büchner, C., Heyde, M., & Freund, H.-J. (2018). Transfer of 2D Silica Films. In K. Wandelt (Ed.), Encyclopedia of Interfacial Chemistry (pp. 360-366). Amsterdam: Elsevier. doi:10.1016/B978-0-12-409547-2.14171-X.


Cite as: https://hdl.handle.net/11858/00-001M-0000-002E-976F-F
Abstract
2D silica bilayers are coordinatively self-saturated oxide layers with an SiO2 stoichiometry and well-defined thickness. They interact weakly with their substrate and can be grown with amorphous, crystalline, or a mixed topology. Recently, a mechanical exfoliation method has been presented that allows transferring the vapor-deposited films from the growth substrate to another support material. Throughout this procedure, no significant material loss or damage was observed. Based on this transferability, the incorporation of 2D silica films in various applications is feasible.