de.mpg.escidoc.pubman.appbase.FacesBean
Deutsch
 
Hilfe Wegweiser Datenschutzhinweis Impressum Kontakt
  DetailsucheBrowse

Datensatz

DATENSATZ AKTIONENEXPORT

Freigegeben

Zeitschriftenartikel

Exploring Pd adsorption, diffusion, permeation, and nucleation on bilayer SiO2/Ru as a function of hydroxylation and precursor environment: From UHV to catalyst preparation

MPG-Autoren
http://pubman.mpdl.mpg.de/cone/persons/resource/persons118135

Pomp,  Sascha
Chemical Physics, Fritz Haber Institute, Max Planck Society;
Institute of Physics, University of Graz;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons21688

Kaden,  William
Chemical Physics, Fritz Haber Institute, Max Planck Society;
Department of Physics, University of Central Florida;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons22140

Sterrer,  Martin
Chemical Physics, Fritz Haber Institute, Max Planck Society;
Institute of Physics, University of Graz;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons21524

Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

Externe Ressourcen
Es sind keine Externen Ressourcen verfügbar
Volltexte (frei zugänglich)

Pd_SiO2_SurfSci2016.pdf
(beliebiger Volltext), 2MB

Ergänzendes Material (frei zugänglich)
Es sind keine frei zugänglichen Ergänzenden Materialien verfügbar
Zitation

Pomp, S., Kaden, W., Sterrer, M., & Freund, H.-J. (2016). Exploring Pd adsorption, diffusion, permeation, and nucleation on bilayer SiO2/Ru as a function of hydroxylation and precursor environment: From UHV to catalyst preparation. Surface Science, 652, 286-293. doi:10.1016/j.susc.2015.12.030.


Zitierlink: http://hdl.handle.net/11858/00-001M-0000-0029-7FC0-C
Zusammenfassung
The hydroxylation-dependent permeability of bilayer SiO2 supported on Ru(0001) was investigated by XPS and TDS studies in a temperature range of 100K to 600K. For this, the thermal behavior of Pd evaporated at 100K, which results in surface and sub-surface (Ru-supported) binding arrangements, was examined relative to the extent of pre-hydroxylation. Samples containing only defect-mediated hydroxyls showed no effect on Pd diffusion through the film at low temperature. If, instead, the concentration of strongly bound hydroxyl groups and associated weakly bound water molecules was enriched by an electron-assisted hydroxylation procedure, the probability for Pd diffusion through the film is decreased via a pore-blocking mechanism. Above room temperature, all samples showed similar behavior, reflective of particle nucleation above the film and eventual agglomeration with any metal atoms initially binding beneath the film. When depositing Pd onto the same SiO2/Ru model support via adsorption of [Pd(NH3)4]C2 from alkaline (pH12) precursor solution, we observe notably different adsorption and nucleation mechanisms. The resultant Pd adsorption complexes follow established decomposition pathways to produce model catalyst systems compatible with those created exclusively within UHV despite lacking the ability to penetrate the film due to the increased size of the initial Pd precursor groups.