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Strain mapping for advanced CMOS technologies

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Tyutyunnikov,  D.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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van Aken,  P. A.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Özdöl, V. B., Tyutyunnikov, D., Koch, C. T., & van Aken, P. A. (2014). Strain mapping for advanced CMOS technologies. Crystal Research and Technology, 49(1), 38-42. doi:10.1002/crat.201300226.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0015-87FD-4
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