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Conference Paper

Effect of chemical etching on poly(methyl methacrylate) irradiated with slow highly charged ions

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Ginzel,  Rainer
Division Prof. Dr. Joachim H. Ullrich, MPI for Nuclear Physics, Max Planck Society;

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Crespo López-Urrutia,  José R.
Division Prof. Dr. Joachim H. Ullrich, MPI for Nuclear Physics, Max Planck Society;

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Citation

Ritter, R., Wilhelm, R. A., Ginzel, R., Schadauer, P., Heller, R., Rupp, W., et al. (2013). Effect of chemical etching on poly(methyl methacrylate) irradiated with slow highly charged ions. Physica Scripta T, 156: 014065, 1-3. doi:10.1088/0031-8949/2013/T156/014065.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0014-BB17-9
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