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Journal Article

Stabilization of semiconductor surfaces through bulk dopants

MPS-Authors
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Xu,  Yong
Theory, Fritz Haber Institute, Max Planck Society;

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Hofmann,  Oliver T.
Theory, Fritz Haber Institute, Max Planck Society;

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Rinke,  Patrick
Theory, Fritz Haber Institute, Max Planck Society;

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1367-2630_15_8_083009.pdf
(Publisher version), 446KB

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Citation

Moll, N., Xu, Y., Hofmann, O. T., & Rinke, P. (2013). Stabilization of semiconductor surfaces through bulk dopants. New Journal of Physics, 15(8): 083009. doi:10.1088/1367-2630/15/8/083009.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0013-FCEE-1
Abstract
We show by employing density-functional theory (DFT) calculations
(including a hybrid functional) that ZnO surfaces can be stabilized by bulk dopants.
As an example, we study the bulk-terminated ZnO (0001) surface covered with half
a monolayer of hydrogen. We demonstrate that deviations from this half-monolayer
coverage can be stabilized by electrons or holes from bulk dopants. The electron
chemical potential therefore becomes a crucial parameter that cannot be neglected
in semiconductor surface studies. As one result, we nd that to form the defect-free
surface with a half-monolayer coverage of hydrogen for n-type ZnO, ambient hydrogen
background pressures are more conducive than high vacuum pressures.