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Ion beam lithography for Fresnel zone plates in X-ray microscopy

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75670

Keskinbora,  K.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75526

Grévent,  C.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons86877

Bechtel,  M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76272

Weigand,  M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75502

Goering,  E.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76085

Schütz,  G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Keskinbora, K., Grévent, C., Bechtel, M., Weigand, M., Goering, E., Nadzeyka, A., et al. (2013). Ion beam lithography for Fresnel zone plates in X-ray microscopy. Optics Express, 21(10), 11747-11756. doi:10.1364/OE.21.011747.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0013-769F-7
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