Ion beam lithography for Fresnel zone plates in X-ray microscopy

Keskinbora, K.; Grévent, C.; Bechtel, M.; Weigand, M.; Goering, E.; Nadzeyka, A.; Lloyd, P.; Rehbein, S.; Schneider, G.; Follath, R.; Vila-Comamala, J.; Yan, H.; Schütz, G.

doi:10.1364/OE.21.011747

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Ion beam lithography for Fresnel zone plates in X-ray microscopy

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Keskinbora, K.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Grévent, C.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Bechtel, M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Weigand, M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Goering, E.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Schütz, G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Keskinbora, K., Grévent, C., Bechtel, M., Weigand, M., Goering, E., Nadzeyka, A., et al. (2013). Ion beam lithography for Fresnel zone plates in X-ray microscopy. Optics Express, 21(10), 11747-11756. doi:10.1364/OE.21.011747.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0013-769F-7

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