Stability of thin wetting films on chemically nanostructured surfaces

Checco, A.; Ocko, B. M.; Tasinkevych, M.; Dietrich, S.

doi:10.1103/PhysRevLett.109.166101

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Stability of thin wetting films on chemically nanostructured surfaces

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Tasinkevych, M.
Dept. Theory of Inhomogeneous Condensed Matter, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institut für Theoretische und Angewandte Physik, Universität StuttgartPfaffenwaldring 57, D-70569 Stuttgart, Germany;

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Dietrich, S.
Dept. Theory of Inhomogeneous Condensed Matter, Max Planck Institute for Intelligent Systems, Max Planck Society;
Institut für Theoretische und Angewandte Physik, Universität StuttgartPfaffenwaldring 57, D-70569 Stuttgart, Germany;

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Checco, A., Ocko, B. M., Tasinkevych, M., & Dietrich, S. (2012). Stability of thin wetting films on chemically nanostructured surfaces. Physical Review Letters, 109(16): 166101. doi:10.1103/PhysRevLett.109.166101.

Cite as: https://hdl.handle.net/11858/00-001M-0000-000E-B340-A

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