Simulating different manufactured antireflective sub-wavelength structures 
considering the influence of local topographic variations

Lehr, D.; Helgert, M.; Sundermann, M.; Morhard, C.; Pacholski, C.; Spatz, J. P.; Brunner, R.

doi:10.1364/OE.18.023878

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Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations

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Morhard, C.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Pacholski, C.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Spatz, J. P.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Lehr, D., Helgert, M., Sundermann, M., Morhard, C., Pacholski, C., Spatz, J. P., et al. (2010). Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations. Optics Express, 18(23), 23878-23890. doi:10.1364/OE.18.023878.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-4F93-3

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