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Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75869

Morhard,  C.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75927

Pacholski,  C.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76135

Spatz,  J. P.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Lehr, D., Helgert, M., Sundermann, M., Morhard, C., Pacholski, C., Spatz, J. P., et al. (2010). Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations. Optics Express, 18(23), 23878-23890. doi:10.1364/OE.18.023878.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-4F93-3
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