Nanoscale planar faulting in nanocrystalline Ni-W thin films: grain growth, 
segregation, and residual stress

Welzel, U.; Kümmel, J.; Bischoff, E.; Kurz, S.; Mittemeijer, E. J.

doi:10.1557/jmr.2011.238

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Nanoscale planar faulting in nanocrystalline Ni-W thin films: grain growth, segregation, and residual stress

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Welzel, U.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Kümmel, J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Bischoff, E.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Kurz, S.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, E. J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Materialwissenschaft;

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Welzel, U., Kümmel, J., Bischoff, E., Kurz, S., & Mittemeijer, E. J. (2011). Nanoscale planar faulting in nanocrystalline Ni-W thin films: grain growth, segregation, and residual stress. Journal of Materials Research, 26, 2558-2573. doi:10.1557/jmr.2011.238.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-4EB4-1

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