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Nanoscale planar faulting in nanocrystalline Ni-W thin films: grain growth, segregation, and residual stress

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http://pubman.mpdl.mpg.de/cone/persons/resource/persons76284

Welzel,  U.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75733

Kümmel,  J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75288

Bischoff,  E.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75744

Kurz,  S.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75858

Mittemeijer,  E. J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Materialwissenschaft;

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Citation

Welzel, U., Kümmel, J., Bischoff, E., Kurz, S., & Mittemeijer, E. J. (2011). Nanoscale planar faulting in nanocrystalline Ni-W thin films: grain growth, segregation, and residual stress. Journal of Materials Research, 26, 2558-2573. doi:10.1557/jmr.2011.238.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-4EB4-1
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