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Dynamic behavior of nanometer-scale amorphous intergranular film in silicon nitride by in situ high-resolution transmission electron microscopy

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons76113

Sigle,  W.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75691

Koch,  C. T.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76016

Rühle,  M.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Zhang, Z., Sigle, W., Koch, C. T., & Rühle, M. (2011). Dynamic behavior of nanometer-scale amorphous intergranular film in silicon nitride by in situ high-resolution transmission electron microscopy. Journal of the European Ceramic Society, 31(9), 1835-1840. doi:10.1016/j.jeurceramsoc.2011.03.016.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-4E5A-F
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