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Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes

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Mayer,  M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Keskinbora,  K.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Grévent,  C.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Weigand,  M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Hirscher,  M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Schütz,  G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Nadzeyka, A., Peto, L., Bauerdick, S., Mayer, M., Keskinbora, K., Grévent, C., et al. (2012). Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes. Special Issue: Micro- and Nano-Engineering (MNE) Sept. 19-23, 2011, Berlin, selected contributions: Part II, 198-201. doi:10.1016/j.mee.2012.07.036.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-4BB2-0
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