de.mpg.escidoc.pubman.appbase.FacesBean
English
 
Help Guide Disclaimer Contact us Login
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75840

Mayer,  M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75670

Keskinbora,  K.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75526

Grévent,  C.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76272

Weigand,  M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75587

Hirscher,  M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76085

Schütz,  G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

Locator
There are no locators available
Fulltext (public)
There are no public fulltexts available
Supplementary Material (public)
There is no public supplementary material available
Citation

Nadzeyka, A., Peto, L., Bauerdick, S., Mayer, M., Keskinbora, K., Grévent, C., et al. (2012). Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes. Special Issue: Micro- and Nano-Engineering (MNE) Sept. 19-23, 2011, Berlin, selected contributions: Part II, 198-201. doi:10.1016/j.mee.2012.07.036.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-4BB2-0
Abstract
There is no abstract available