Compression of stacked niobium bilayers: void-induced strain localisation at 
interfaces

Liu, Y.; Brunner, D.; Rühle, M.

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Compression of stacked niobium bilayers: void-induced strain localisation at interfaces

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Brunner, D.
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Rühle, M.
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Liu, Y., Brunner, D., & Rühle, M. (2006). Compression of stacked niobium bilayers: void-induced strain localisation at interfaces. Applied Physics Letters, 89: 141909.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-488E-5

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