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Journal Article

Mechanisms for the enhancement of the thermal stability of organic thin films by aluminum oxide capping layers

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons76101

Sellner,  S.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75666

Kelsch,  M.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75658

Kasper,  N.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75415

Dosch,  H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Theoretische und Angewandte Physik;

Ulbricht,  G.
Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76071

Schreiber,  F.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Sellner, S., Kelsch, M., Kasper, N., Dosch, H., Ulbricht, G., Gerlach, A., et al. (2006). Mechanisms for the enhancement of the thermal stability of organic thin films by aluminum oxide capping layers. Journal of Materials Research, 21(2), 455-464.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-4636-C
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