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Journal Article

Fatigue damage in thin film Al interconnects at ultra high frequency: A finite element analysis approach

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Eberl,  C.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Spolenak,  R.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Kraft,  O.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Arzt,  E.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Metallkunde;

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Citation

Eberl, C., Spolenak, R., Kraft, O., Ruile, W., & Arzt, E. (2006). Fatigue damage in thin film Al interconnects at ultra high frequency: A finite element analysis approach. Thin Solid Films, 515, 3291-3297.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-461A-C
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