Structural rearrangements during the initial growth stages of organic thin 
films of F16CuPc on SiO2

de Oteyza, D. G; Barrena, E.; Sellner, S.; Oriol Osso, J.; Dosch, H.

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Structural rearrangements during the initial growth stages of organic thin films of F₁₆CuPc on SiO₂

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de Oteyza, D. G
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Barrena, E.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Sellner, S.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Dosch, H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Theoretische und Angewandte Physik;

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de Oteyza, D. G., Barrena, E., Sellner, S., Oriol Osso, J., & Dosch, H. (2006). Structural rearrangements during the initial growth stages of organic thin films of F₁₆CuPc on SiO₂. Journal of Physical Chemistry B, 110, 16618-16623.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-45C4-1

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