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Structural rearrangements during the initial growth stages of organic thin films of F16CuPc on SiO2

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http://pubman.mpdl.mpg.de/cone/persons/resource/persons75397

de Oteyza,  D. G
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75252

Barrena,  E.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76101

Sellner,  S.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75415

Dosch,  H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Theoretische und Angewandte Physik;

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Citation

de Oteyza, D. G., Barrena, E., Sellner, S., Oriol Osso, J., & Dosch, H. (2006). Structural rearrangements during the initial growth stages of organic thin films of F16CuPc on SiO2. Journal of Physical Chemistry B, 110, 16618-16623.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-45C4-1
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