X-ray diffraction and STM study of reactive surfaces under electrochemical 
control: Cl and I on Cu(100)

Huemann, S.; Hai, T. M.; Broekmann, P.; Wandelt, K.; Zajonz, H.; Dosch, H.; Renner, F.

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X-ray diffraction and STM study of reactive surfaces under electrochemical control: Cl and I on Cu(100)

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Zajonz, H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Dosch, H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Theoretische und Angewandte Physik;

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Renner, F.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Huemann, S., Hai, T. M., Broekmann, P., Wandelt, K., Zajonz, H., Dosch, H., et al. (2006). X-ray diffraction and STM study of reactive surfaces under electrochemical control: Cl and I on Cu(100). Journal of Physical Chemistry B, 110, 24955-24963.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-455D-D

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