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Journal Article

SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography

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del Campo,  A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Greiner,  C.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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del Campo, A., & Greiner, C. (2007). SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography. Journal for Micromechanics and Microengineering, 17(6), R81-R95.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-43AB-D
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