English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Transition from layer-by-layer to rapid roughening in the growth of DIP on SiO2

MPS-Authors
/persons/resource/persons76326

Zhang,  X .N.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons75252

Barrena,  E.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons75397

de Oteyza,  D. G.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons75415

Dosch,  H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Theoretische und Angewandte Physik;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Zhang, X.., Barrena, E., de Oteyza, D. G., & Dosch, H. (2007). Transition from layer-by-layer to rapid roughening in the growth of DIP on SiO2. Surface Science, 601, 2420-2425.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-42C1-5
Abstract
There is no abstract available