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Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model system for Ru-capped extreme ultraviolet lithography optics

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75567

He,  Y.B
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76157

Stierle,  A.
Former Central Scientific Facility ANKA Synchroton Beamline, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75658

Kasper,  N.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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He, Y., Goriachko, A., Korte, C., Farkas, A., Mellau, G., Dudin, P., et al. (2007). Oxidation and reduction of ultrathin nanocrystalline Ru films on silicon: model system for Ru-capped extreme ultraviolet lithography optics. Journal of Physical Chemistry C, 111(24), 10988-10992.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-42A9-E
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