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Determination of depth gradients of grain interaction and stress in Cu thin films.

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons76299

Wohlschlögel,  M.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75261

Baumann,  W.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76284

Welzel,  U.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75858

Mittemeijer,  E. J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Materialwissenschaft;

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Wohlschlögel, M., Baumann, W., Welzel, U., & Mittemeijer, E. J. (2008). Determination of depth gradients of grain interaction and stress in Cu thin films. Applied Crystallography, 41, 1067-1075.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-419E-E
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