Titanium–silicon oxide film structures for polarization-modulated infrared 
reflection absorption spectroscopy

Dunlop, I. E.; Zorn, S.; Richter, G.; Srot, V.; Kelsch, M.; van Aken, P. A.; Skoda, M.; Gerlach, A.; Spatz, J. P.; Schreiber, F.

doi:10.1016/j.tsf.2008.10.058

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Titanium–silicon oxide film structures for polarization-modulated infrared reflection absorption spectroscopy

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Dunlop, I. E.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Richter, G.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;
Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Srot, V.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Kelsch, M.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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van Aken, P. A.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Spatz, J. P.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Schreiber, F.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Dunlop, I. E., Zorn, S., Richter, G., Srot, V., Kelsch, M., van Aken, P. A., et al. (2009). Titanium–silicon oxide film structures for polarization-modulated infrared reflection absorption spectroscopy. Thin Solid Films, 517, 2048-2054. doi:10.1016/j.tsf.2008.10.058.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-3D50-A

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