Ordered nanopore boring in silicon: Metal-assisted etching using a self-aligned 
block copolymer Au nanoparticle template and gravity accelerated etching

Bauer, S.; Brunner, J. G.; Jha, H.; Yasukawa, Y.; Asoh, H.; Ono, S.; Böhm, H.; Spatz, J. P.; Schmuki, P.

doi:10.1016/j.elecom.2010.02.00

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Ordered nanopore boring in silicon: Metal-assisted etching using a self-aligned block copolymer Au nanoparticle template and gravity accelerated etching

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Böhm, H.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Spatz, J. P.
Dept. New Materials and Biosystems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Bauer, S., Brunner, J. G., Jha, H., Yasukawa, Y., Asoh, H., Ono, S., et al. (2010). Ordered nanopore boring in silicon: Metal-assisted etching using a self-aligned block copolymer Au nanoparticle template and gravity accelerated etching. Electrochemistry Communications, 12, 565-569. doi:10.1016/j.elecom.2010.02.00.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-3BD2-3

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