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Conference Paper

Transmission electron microscopy study of erbium silicide formation from Ti/Er stack for Schottky contact applications

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75946

Phillipp,  F.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76219

van Aken,  P. A.
Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Ratajczak, J., Łaszcz, A., Czerwinski, A., Katcki, J., Phillipp, F., van Aken, P. A., et al. (2010). Transmission electron microscopy study of erbium silicide formation from Ti/Er stack for Schottky contact applications. Journal of Microscopy, 237(3), 379-383.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-3B64-A
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