Microstructural evolution of ion-bombarded copper thin films

Wagner, T.; Müller, D.

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Microstructural evolution of ion-bombarded copper thin films

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Wagner, T.
Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Wagner, T., & Müller, D. (2000). Microstructural evolution of ion-bombarded copper thin films. In S. Moss (Ed.), Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing (pp. 85-90). Warrendale/PA: Materials Research Society.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-39BC-5

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