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{B[C2H4Si(CH3)NH]2[C2H4Si(CH3)N(SiH2Ph)]}n: The first polyborosilazane precursor for silicoboron carbonitride stable to 2200 degrees C

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75497

Gerstel,  P.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75645

Kaiser,  G.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75734

Kummer,  H.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75211

Aldinger,  F.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Nichtmetallische Anorganische Materialien;

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Citation

Wang, Z. C., Gerstel, P., Kaiser, G., Kummer, H., Bill, J., Aldinger, F., et al. (2001). {B[C2H4Si(CH3)NH]2[C2H4Si(CH3)N(SiH2Ph)]}n: The first polyborosilazane precursor for silicoboron carbonitride stable to 2200 degrees C. Chemistry Letters, (4), 296-297.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-352A-D
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