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Chemical liquid deposition of gallium nitride thin films on siloxane-anchored self-assembled monolayers

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75895

Niesen,  T. P.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75960

Puchinger,  M.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75497

Gerstel,  P.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76249

Wagner,  T.
Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75211

Aldinger,  F.
Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Nichtmetallische Anorganische Materialien;

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Citation

Niesen, T. P., Puchinger, M., Gerstel, P., Rodewald, D., Wolff, J., Wagner, T., et al. (2002). Chemical liquid deposition of gallium nitride thin films on siloxane-anchored self-assembled monolayers. Materials Chemistry and Physics, 73(2-3), 301-305.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-3245-D
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