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Interfacial electronic structure of thin Cu films grown on Ar+- ion sputter-cleaned α-Al2O3 substrates

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons76047

Scheu,  C.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75482

Gao,  M.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76016

Rühle,  M.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Scheu, C., Gao, M., & Rühle, M. (2002). Interfacial electronic structure of thin Cu films grown on Ar+- ion sputter-cleaned α-Al2O3 substrates. Journal of Materials Science & Technology, 18(2), 117-120.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-31ED-C
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