Interfacial electronic structure of thin Cu films grown on Ar+- ion 
sputter-cleaned α-Al2O3 substrates

Scheu, C.; Gao, M.; Rühle, M.

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Interfacial electronic structure of thin Cu films grown on Ar+- ion sputter-cleaned α-Al₂O₃ substrates

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Scheu, C.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Gao, M.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Rühle, M.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Scheu, C., Gao, M., & Rühle, M. (2002). Interfacial electronic structure of thin Cu films grown on Ar+- ion sputter-cleaned α-Al₂O₃ substrates. Journal of Materials Science & Technology, 18(2), 117-120.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-31ED-C

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