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Fatigue behavior of polycrystalline thin copper films

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75712

Kraft,  O.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76282

Wellner,  P.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75600

Hommel,  M.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76086

Schwaiger,  R.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75228

Arzt,  E.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Metallkunde;

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Citation

Kraft, O., Wellner, P., Hommel, M., Schwaiger, R., & Arzt, E. (2002). Fatigue behavior of polycrystalline thin copper films. Zeitschrift für Metallkunde, 93(5), 392-400.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-3132-0
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