de.mpg.escidoc.pubman.appbase.FacesBean
English
 
Help Guide Privacy Policy Disclaimer Contact us
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Growth of electromigration-induced hillocks in Al interconnects

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons75903

Nucci,  J. A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76162

Straub,  A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75288

Bischoff,  E.
Former Central Scientific Facility Metallography, Max Planck Institute for Intelligent Systems, Max Planck Society;
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75228

Arzt,  E.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Metallkunde;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76232

Volkert,  C. A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

Locator
There are no locators available
Fulltext (public)
There are no public fulltexts available
Supplementary Material (public)
There is no public supplementary material available
Citation

Nucci, J. A., Straub, A., Bischoff, E., Arzt, E., & Volkert, C. A. (2002). Growth of electromigration-induced hillocks in Al interconnects. Journal of Materials Research, 17(10), 2727-2735.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-2FE6-B
Abstract
There is no abstract available