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Effect of film thickness and grain size on fatigue-induced dislocation structures in Cu thin films

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons76320

Zhang,  G. P.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76086

Schwaiger,  R.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons76232

Volkert,  C. A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons75712

Kraft,  O.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Citation

Zhang, G. P., Schwaiger, R., Volkert, C. A., & Kraft, O. (2003). Effect of film thickness and grain size on fatigue-induced dislocation structures in Cu thin films. Philosophical Magazine Letters, 83(8), 477-483.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-2E1D-4
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