AES depth profiling of thermally treated Al/Si thin-film structures

Zalar, A.; Wang, J.Y.; Zhao, Y.H.; Mittemeijer, E.J.; Panjan, P.

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AES depth profiling of thermally treated Al/Si thin-film structures

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Wang, J.Y.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Zhao, Y.H.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Mittemeijer, E.J.
Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Materialwissenschaft;

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Zalar, A., Wang, J., Zhao, Y., Mittemeijer, E., & Panjan, P. (2003). AES depth profiling of thermally treated Al/Si thin-film structures. Vacuum, 71, 11-17.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-2D73-8

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