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X-Ray diffraction study of the ultrathin Al2O3 layer on NiAl(110)

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Stierle,  A.
Former Central Scientific Facility ANKA Synchroton Beamline, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Renner,  F.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Streitel,  R.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Dosch,  H.
Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;
Universität Stuttgart, Institut für Theoretische und Angewandte Physik;

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Citation

Stierle, A., Renner, F., Streitel, R., Dosch, H., Drube, W., & Cowie, B. C. (2004). X-Ray diffraction study of the ultrathin Al2O3 layer on NiAl(110). Science, 303, 1652-1656.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-2966-8
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