Johnson, Benjamin Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;
HCl Etch Final.pdf (Any fulltext), 295KB
Johnson, B., Klaer, J., Fischer, C.-H., & Lauermann, I. (2012). Depth profiling of a CdS buffer layer on CuInS2 measured with X-ray photoelectron spectroscopy during removal by HCl etching. Thin solid films, 520(7), 2829-2832. doi:10.1016/j.tsf.2011.10.144.