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Journal Article

Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons21743

Knop-Gericke,  Axel
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons22071

Schlögl,  Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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c3ra23304a.pdf
(Publisher version), 3MB

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Citation

Bayer, B. C., Castellarin-Cudia, C., Blume, R., Steiner, S. A., Ducati, C., Chu, D., et al. (2013). Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes. RSC Advances, 3(12), 4086-4092. doi:10.1039/C3RA23304A.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-0CE3-3
Abstract
Ta-oxide thin films are shown to catalyse carbon nanotube growth by chemical vapour deposition. A low film thickness, the nature of the support material (best results with SiO2) and an atmospheric process gas pressure are of key importance for successful nanotube nucleation. Strong material interactions, such as silicide formation, inhibit nanotube growth. In-situ X-ray photoelectron spectroscopy indicates that no catalyst reduction to a metal or carbide occurs during nanotube growth and that the catalytically active phase is the Ta-oxide phase. Such a reductionfree oxide catalyst can be advantageous for integration of nanotubes into electronics.