Influence of Ar, Kr, and Xe layers on the energies and lifetimes of 
image-potential states on Cu(100)

Berthold, W.; Rebentrost, Frank; Feulner, P.; Höfer, Ulrich

doi:10.1007/s00339-003-2310-6

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Influence of Ar, Kr, and Xe layers on the energies and lifetimes of image-potential states on Cu(100)

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Rebentrost, Frank
Laser Chemistry, Max Planck Institute of Quantum Optics, Max Planck Society;

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Höfer, Ulrich
Laser Chemistry, Max Planck Institute of Quantum Optics, Max Planck Society;

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Berthold, W., Rebentrost, F., Feulner, P., & Höfer, U. (2004). Influence of Ar, Kr, and Xe layers on the energies and lifetimes of image-potential states on Cu(100). Applied Physics A: Materials Science A& Processing, 78(2), 131-140. doi:10.1007/s00339-003-2310-6.

Cite as: https://hdl.handle.net/11858/00-001M-0000-000F-BF72-6

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