Müllen, Klaus MPI for Polymer Research, Max Planck Society;
Schmidt, M. MPI for Polymer Research, Max Planck Society;
Schenk, R., Halle, O., Müllen, K., Ehrfeld, W., & Schmidt, M. (1997). Highly sensitive resist material for deep X-ray lithography. Microelectronic Engineering, 35(1-4), 105-108.