de.mpg.escidoc.pubman.appbase.FacesBean
English
 
Help Guide Disclaimer Contact us Login
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Highly sensitive resist material for deep X-ray lithography

MPS-Authors
http://pubman.mpdl.mpg.de/cone/persons/resource/persons48459

Müllen,  Klaus
MPI for Polymer Research, Max Planck Society;

http://pubman.mpdl.mpg.de/cone/persons/resource/persons48712

Schmidt,  M.
MPI for Polymer Research, Max Planck Society;

Locator
There are no locators available
Fulltext (public)
There are no public fulltexts available
Supplementary Material (public)
There is no public supplementary material available
Citation

Schenk, R., Halle, O., Müllen, K., Ehrfeld, W., & Schmidt, M. (1997). Highly sensitive resist material for deep X-ray lithography. Microelectronic Engineering, 35(1-4), 105-108.


Cite as: http://hdl.handle.net/11858/00-001M-0000-000F-5A02-4
Abstract
There is no abstract available