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Feature Sensitive Bas Relief Generation

MPG-Autoren
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Kerber,  Jens
Computer Graphics, MPI for Informatics, Max Planck Society;

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Tevs,  Art
Computer Graphics, MPI for Informatics, Max Planck Society;
International Max Planck Research School, MPI for Informatics, Max Planck Society;

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Zayer,  Rhaleb
Computer Graphics, MPI for Informatics, Max Planck Society;

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Belyaev,  Alexander
Computer Graphics, MPI for Informatics, Max Planck Society;

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Seidel,  Hans-Peter       
Computer Graphics, MPI for Informatics, Max Planck Society;

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Zitation

Kerber, J., Tevs, A., Zayer, R., Belyaev, A., & Seidel, H.-P. (2009). Feature Sensitive Bas Relief Generation. In J.-H. Yong, M. Spagnuolo, & W. Wang (Eds.), IEEE International Conference on Shape Modeling and Applications Proceedings (pp. 148-154). Washington, USA: IEEE Computer Society Press.


Zitierlink: https://hdl.handle.net/11858/00-001M-0000-000F-19AD-0
Zusammenfassung
Among all forms of sculpture, bas-relief is arguably the closest to painting. Although inherently a two dimensional sculpture, a bas-relief suggests a visual spatial extension of the scene in depth through the combination of composition, perspective, and shading. Most recently, there have been significant results on digital bas-relief generation but many of the existing techniques may wash out high level surface detail during the compression process. The primary goal of this work is to address the problem of fine features by tailoring a filtering technique that achieves good compression without compromising the quality of surface details. As a secondary application we explore the generation of artistic relief which mimic cubism in painting and we show how it could be used for generating Picasso like portraits.