A study on the metal-organic CVD of pure copper films from low cost copper(II) 
dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by 
small variations of the ligand

Becker, R.; Devi, A.; Weiss, J.; Weckenmann, U.; Winter, M.; Kiener, C.; Becker, H. W.; Fischer, R. A.

doi:10.1002/cvde.200306236

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A study on the metal-organic CVD of pure copper films from low cost copper(II) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand

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Winter, M.
Research Department Fink, Max-Planck-Institut für Kohlenforschung, Max Planck Society;

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Kiener, C.
Research Department Schüth, Max-Planck-Institut für Kohlenforschung, Max Planck Society;
Research Department Schüth, Max-Planck-Institut für Kohlenforschung, Max Planck Society;
Research Department Schüth, Max-Planck-Institut für Kohlenforschung, Max Planck Society;

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Becker, R., Devi, A., Weiss, J., Weckenmann, U., Winter, M., Kiener, C., et al. (2003). A study on the metal-organic CVD of pure copper films from low cost copper(II) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand. Chemical Vapor Deposition, 9(3), 149-156. doi:10.1002/cvde.200306236.

Cite as: https://hdl.handle.net/11858/00-001M-0000-000F-987B-F

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