Near-Field Lithography by Two-Photon-Induced Photocleavage of Organic Monolayers

Alvarez, M.; Best, A.; Unger, A.; Alonso, J. M.; del Campo, Aranzazu; Schmelzeisen, M.; Koynov, Kaloian; Kreiter, Max

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Near-Field Lithography by Two-Photon-Induced Photocleavage of Organic Monolayers

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Alvarez, M.
MPI for Polymer Research, Max Planck Society;

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Best, A.
MPI for Polymer Research, Max Planck Society;

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Unger, A.
MPI for Polymer Research, Max Planck Society;

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del Campo, Aranzazu
MPI for Polymer Research, Max Planck Society;

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Schmelzeisen, M.
MPI for Polymer Research, Max Planck Society;

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Koynov, Kaloian
MPI for Polymer Research, Max Planck Society;

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Kreiter, Max
MPI for Polymer Research, Max Planck Society;

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Alvarez, M., Best, A., Unger, A., Alonso, J. M., del Campo, A., Schmelzeisen, M., Koynov, K., & Kreiter, M. (2010). Near-Field Lithography by Two-Photon-Induced Photocleavage of Organic Monolayers. Advanced Functional Materials, 20(24), 4265-4272.

引用: https://hdl.handle.net/11858/00-001M-0000-000F-7432-8

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